Picture of Mask Aligner - Karl Suss MA56 (new)
Current status:
AVAILABLE
Book | Log
Show/Collapse all

1st Responsible:
2nd Responsible:
You must be logged in to view files.

Mask Aligner donated from NTNU.

Nearly new (1989) !

The Karl Suss MA 56 is a mask alignment and exposure system which offers unsurpassed, highly economical mass production capabilities for cassette to cassette handling of wafers up to 4″ wafers and 5″ masks, although smaller wafers and chips may be mounted to a 4″ carrier wafer and processed.  The light source is a 350 W mercury arc lamp with 365 nm wavelength.  The vacuum contact mode is available. 
The microscope has dual alignment objectives and split-field viewing.  The mask and microscope have motorized motion in x and y, and they may be moved together or independently over the stationary wafer.
 Possible contact modes:

 

  • Soft contact

 

Tool name:
Mask Aligner - Karl Suss MA56 (new)
Area/room:
G2-33 Cleanroom
Category:
Lithography
Manufacturer:
Karl Suss
Model:
MA 56
Max booking time, day:
hours
Max booking time, night:
hours
No. of future bookings:

Instructors

Licensed Users

You must be logged in to view tool modes.