The Spin, Rinse and Dry (SRD) equipment from STI Semitool is an automatic machine for cleaning of wafers. It is capable of rinsing and drying Si wafers, GaAs wafers and masks. The three-stage SRD has the capability to clean up to 24 wafers each run. Fast and easy to use.

Technical Data: Handles up to 24 wafers each run.