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The Spin, Rinse and Dry (SRD) equipment from STI Semitool is an automatic machine for cleaning of wafers. It is capable of rinsing and drying Si wafers, GaAs wafers and masks. The three-stage SRD has the capability to clean up to 24 wafers each run. Fast and easy to use.

Technical Data: Handles up to 24 wafers each run.

Tool name:
Rinse and dry STI Semitool
Area/room:
G2-33 Cleanroom
Category:
Lithography
Manufacturer:
STI Semitool
Model:
STI Semitool
Max booking time, day:
hours
Max booking time, night:
hours
No. of future bookings:

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