Picture of Tube Furnace High Temperature 2"
Current status:
AVAILABLE
Book | Log
Show/Collapse all

1st Responsible:
2nd Responsible:
You must be logged in to view files.

High temperature processing includes a diversity of processes where high temperatures are used. Hence, annealing may be necessary to activate dopants after ion implantation or to alloy contacts after metal deposition, while treatment in a chemically active atmosphere is used to change the surface layer, e.g., by diffusion of dopants and thermal oxidation of a Si surface. Typical use is alloying of metall contacts or sealing frames with respect to packaging of devices or wafers (wafer level packaging). The furnace can be placed in multi positions: vertically, horizontally or at an angle to f.eks. grow crystals or other materials.  Rotate vertically for sintering applications. Gases that can be connected are O2, N2 and Hand forming gas. Normally only one gas at the time. Annealing in vacuum is also possible (optional).

OBS: the glass tube is only 2" !


Possible processes:

Diffusion and activation

  • Alloying
  • Growing

 

Technical Data: Handles 1" wafers and  small pieces. Max peak Temp. 1100ºC (<1h). Max. continuous temp. 1000ºC. Max heating rate 20ºC/min.

Tool name:
Tube Furnace High Temperature 2"
Area/room:
G2-33 Cleanroom
Category:
Thermal processes
Manufacturer:
MTI Corporation
Model:
MSL
Max booking time, day:
hours
Max booking time, night:
hours
No. of future bookings:

NB: The gases H2 (Hydrogen) and C2H2 (Acetylen) are shared with the CNT reactor.  So book BOTH equipments if these gases are to be used in your experiment !

Instructors

Licensed Users

You must be logged in to view tool modes.